Join Us for the Exclusive KnitWarm X Keiko EyeMask 2.0 Workshop at HK Design Centre!
- KnitWarm
- Oct 30
- 2 min read
Updated: Nov 5
We're excited to invite you to an exclusive hands-on workshop in collaboration with renowned designer Lincoln Szeto! This autumn, DX Design Hub's pop-up transforms into "City Craftique," a curated space celebrating local Hong Kong brands that blend culture, tradition, innovation, and craftsmanship. As part of this vibrant event, we're hosting the KnitWarm X Lincoln Szeto @ Keiko EyeMask 2.0 with Sleepy Kitten Workshop.
Workshop Highlights
Dive into a creative session where you'll use Lincoln Szeto’s exclusive Sleepy Kitten IP to craft a unique EyeMask 2.0. This workshop seamlessly blends artistic hand-drawn illustrations with cutting-edge smart textile technology, allowing you to create a personalized masterpiece.

About EyeMask 2.0
EyeMask 2.0 is a next-generation sensory sleep aid that combines light blocking, heat therapy, and aroma infusion for an enhanced relaxation experience. Designed for frequent travelers, digital professionals, and wellness enthusiasts, this smart textile solution prioritizes comfort, customization, and sustainability.
Unlike traditional sleep masks that are bulky and rigid, EyeMask 2.0 features a seamless, ergonomic fit, ensuring zero facial pressure while maintaining a lightweight and breathable structure. Its washable and reusable nature significantly reduces environmental waste, setting a new standard for sustainable sleep aids. The integration of smart conductive yarns and collagen-infused fabric enhances hygiene, functionality, and user well-being.
With adjustable warmth levels, interchangeable aroma swatches, and a tailored fit for all users, EyeMask 2.0 redefines the sleep experience by offering a personalized, multi-sensory approach to relaxation.

About Lincoln Szeto @ Keiko
A celebrated designer and artist, Lincoln Szeto fuses elegance with practicality. He has earned prestigious accolades, including the German Design Award in 2024 and 2026, as well as the Muse Design Awards Gold. His hand-drawn illustrations elevate this collaboration, turning the EyeMask into a multidimensional work of art. Follow him on Instagram: @c2lincoln.

Event Details
Date: November 8, 2025 (Saturday)
Time: 10:00 AM – 12:00 PM
Location: G/F Pop-up, DX Design Hub, 280 Tong Mi Road, Sham Shui Po, Kowloon
Fee: HK$980 (includes EyeMask 2.0 with battery, all materials, and a HK$100 cash coupon redeemable for KnitWarm products at DX Design Hub)
Spaces are limited, so this is your chance to experience Hong Kong's design ingenuity firsthand! To register or inquire, please contact us via the link https://forms.gle/qfrTymKkvkpfNc9C6 or DM us on Instagram.
Don't miss out on this opportunity to unwind, create, and connect with fellow members in a cozy, inspiring setting. We look forward to seeing you there!
























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